The Solaris 100 is a manual loading RTP system for R&D and pre-production. The Solaris 100 can process up to 101.6mm (4″) substrates at a temperature range from RT up to 1250°C. The unique temperature measurement system of the Solaris requires virtually no calibration for different wafer types and backside emissivity differences.
The Solaris uses a unique PID process controller that ensures accurate temperature stability and uniformity. The system can accommodate four interlocked MFCs for gas mixing and forming gas processing. Our system is currently equipped with O2 and N2 lines.
Steady State Temperature range from Room to 1200oC - Temperature accuracy & Stability of +/- 2.5oC - Ramp Rate up to 150oC/sec - Wafer diameter Sizes from Small pieces to 100mm - Three Zone Temperature Control - MFC Controlled gas Lines.
