Two-photon polymerization as a direct laser writing technique allows for creating complex three-dimensional structures down to feature sizes on the order of 100 nm. Key elements of two-photon polymerization are lasers providing femtosecond pulses, suitable photosensitive materials (photoresists), a precise positioning stage and a computer to control the procedure.
Laser: 773 nm, FWHM 8 nm, 132 fs, 80 MHz, 500 mW - Focusing: manual - Typical processing speed: 0.1-10 mm/s - Maximum axis speed (X, Y): 300 mm/s - Maximum axis speed (Z) : 2000 mm/s - Laser Scanner : Galvano Scanner - Writing area (X, Y): 100 mm x 100 mm - Resolution (X,Y): 4 nm or better - Travel range (Z): 100 mm - Overall accuracy (X, Y, Z): ±200 nm - Repeatability (X, Y): ±50 nm - Repeatability (Z): ±100 nm
